Process for electrochemical deposition of tantalum and an...

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal or alloy coating on...

Reexamination Certificate

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C205S230000

Reexamination Certificate

active

07150818

ABSTRACT:
A process for electrochemical deposition of tantalum on an article in an inert, non-oxidizing atmosphere, or under vacuum, in a molten electrolyte containing tantalum ions, comprising the steps of: immersing the article into the molten electrolyte heated to a working temperature, passing an electric current through the electrolyte to thereby deposit a tantalum coating on the article, wherein the process of tantalum deposition at least in an initial phase deposits pure α-tantalum.

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patent: WO 98/46809 (1998-10-01), None
Bockis, et al, “9.2. The Transient Behavior of Interfaces”, from Modern Electrochemistry, vol. 2, pub. by Plenum Press, Apr. 1973, pp. 1017-1036.
Lee S. L. et al.: “Analysis of Magnetron-sputtered Tantalum Coatings Versus Electrochemically Deposited Tantalum from Molten Salt”, Surface and Coatings Technology 120-121, U.S. Army Armament Research Development and Engineering Center, Benet Laboratories, Watercliet, NY, 1999 pp. 44-52.

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