Process for distributing ultra high purity gases with minimized

Details Process for distributing ultra high purity gases with minimized Process for distributing ultra high purity gases with minimized

1994-12-30

1997-01-07

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

Including use of vacuum, suction, or inert atmosphere

134 2214, 134 2218, 134 2219, 134 254, 134 26, 134 30, B08B 304, B08B 500, B08B 504, B08B 900

Patent

active

055912737

ABSTRACT:
A process for distributing ultra high purity gases with minimized contamination and particulates including; (a) purging said distribution network or any part thereof with dry inert high purity gas comprising less than 1 ppm of any impurity; (b) evacuating said distribution network or any part thereof at a pressure which is lower than 5.times.10.sup.4 Pascal; (b') optionally wet cleaning a gas distribution network or any part thereof with a wet cleaning agent, thereafter (c) liquid drying the gas distribution network or any part thereof with an H.sub.2 O desorbing liquid drying agent selected from the group including acetone dimethylacetal DMP, 2-2 dichloropropane DCP or 2-2 dibromopropane DBP, mixtures thereof and any equivalent thereof, and (d) distributing an ultra high purity gas through the distribution network or any part thereof.

REFERENCES:
patent: 5092937 (1992-03-01), Oqura et al.
patent: 5330652 (1994-07-01), Goldman et al.

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