Process for distributing ultra high purity gases with minimized

Details Process for distributing ultra high purity gases with minimized Process for distributing ultra high purity gases with minimized

1995-07-25

1997-10-14

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

Including use of vacuum, suction, or inert atmosphere

134 2214, 134 2218, 134 2219, 134 254, 134 26, 134 30, 422 7, 422 14, B08B 304, B08B 500, B08B 504, B08B 900

Patent

active

056767625

ABSTRACT:
A process for reducing corrosion in a gas distribution network of ultra high purity gas or any part of said distribution network, including:

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patent: 5092937 (1992-03-01), Ogura et al.
patent: 5330652 (1994-07-01), Goldman et al.
Tatenuma, K. et al. Quick Acquisition of Clean Ultrahigh Vacuum by Chemical Process Technology. Journal Of Vacuum Science And Technology. part A, vol. 11, No. 4, pp. 1719-1724. Jul. 1993.
"Analysis Of Trace Moisture In HCI By Gas-Phase FTIR", Keiji Miyazaki et al, Bull. Chem. Soc. Jpn. 66,969-971 (1993), Mar. 1993, vol. 66, No. 3, pp. 969-971.
"Quick Acquisition Of Clean Ultrahigh Vacuum By Chemical Process Technology", K. Tatenuma et al, J. Vac. Sci. Technol. A 11(4), Jul./Aug. 1993, pp. 1719-1724.
"Concepts In Competitive Microelectronics Manufacturing", Michael Liehr et al, J. Vac. Sci. Technol. B 12(4), Jul./Aug. 1994, pp. 2727-2740.
"Determination Of Trace Impurities In Corrosive Gases By Gas-Phase FTIR", Keiji Miyazaki et al, Bull. Chem. Soc. Jpn. 66,3508-3510 (1993), Nov. 1993, vol. 66, No. 11, pp. 3508-3510.
K. Tatenuma et al, Buneski 223, 393 (1994).

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