Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1998-12-23
2000-07-11
Berman, Susan W.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522163, 522164, 522165, 522166, 522905, 528125, 528128, 528127, 528129, 528143, 528170, 528171, 528179, 528205, 528220, 528227, 528230, 528246, 528306, 528391, 528423, 528226, 528228, 4302701, 4302801, 4302861, C08J 328, G03F 7038, C08G 8500, C08G 6538, C08G 7306
Patent
active
060874147
ABSTRACT:
Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##
REFERENCES:
patent: 2125968 (1938-08-01), Theimer
patent: 3367914 (1968-02-01), Herbert
patent: 3455868 (1969-07-01), D'Alessandro
patent: 3914194 (1975-10-01), Smith
patent: 4086209 (1978-04-01), Hara et al.
patent: 4110279 (1978-08-01), Nelson et al.
patent: 4435496 (1984-03-01), Walls et al.
patent: 4601777 (1986-07-01), Hawkins et al.
patent: 4623558 (1986-11-01), Lin
patent: 4667010 (1987-05-01), Eldin
patent: 4739032 (1988-04-01), Jones
patent: 5268444 (1993-12-01), Jensen et al.
patent: 5336720 (1994-08-01), Richards
patent: 5438082 (1995-08-01), Helmer-Metzmann et al.
patent: 5561202 (1996-10-01), Helmer-Metzmann et al.
patent: 5681888 (1997-10-01), Nomura et al.
patent: 5753783 (1998-05-01), Fuller et al.
patent: 5761809 (1998-06-01), Fuller et al.
patent: 5889077 (1999-03-01), Fuller et al.
patent: 5939206 (1999-08-01), Kneezel et al.
patent: 5945253 (1999-08-01), Narang et al.
patent: 5958995 (1999-09-01), Narang et al.
Daly, "Chloromethylation of Condensation Polymers Containing an Oxy-1,4-Phenylene Backbone," Polymers Preprints (1979), vol. 20, No. 1, pp. 835-837.
Camps, "Chloromethylstyrene: Synthesis, Polymerization, Transformations, Applications," JMS-Rev. Macromol, Chem. Phys., C22(3), 343-407 (1982-83).
Tabata, "Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist," 1984pp. 287-288.
Jurek, "Deep UV Photochemistry of Copolymers of Trimethylsilymethyl Methacrylate and Chloromethylstyrene," Polymer Preprints, 1988, pp. 546-547.
Hergenrother, "Poly(arylene ethers)," Polymer, 1988, vol. 29, Feb.
Havens, "Ethynyl-Terminated Polyarylates: Synthesis and Characterization," Journal of Polymer Science: Polymer Chemistry Edition, vol. 22 (1984), pp. 3011-3025.
Hendricks, "Flare, A Low Dielectric Constant, High Tg, Thermally Stable Poly(Arylene Ether) Dielectric for Microelectronic Circuit Interconnect Process Integration: Synthesis, Characterization, Thermomechanical Properties, and Thin-Film Processing Studies," Polymer Preprints 37(1) 150 (1996), vol. 37, No. 1, Mar. 1996, pp. 150-151.
Zupanic, "Styrene Terminated Resins as Interlevel Dielectrics for Multichip Modules," 1991, pp. 178-179.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis, 2a)," Makromal Chem., 1984, pp. 1867-1880.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis, 3a)," Makronal Chem., 1984, pp. 2319-2336.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis 4. A New and Convenient Synthesis of p- and m-Hydrozymethylphenylacetylene," Polymer Bulletin 10, 223-230, 1983.
Amato, "A New Preparation of Chloromethyl Methyl Ether Free of Bis(chloromethyl) Ether," 1979, George Thieme Publishers.
McKillop, "A Simple and Inexpensive Procedure for Chloromethylation of Certain Aromatic Compounds," Tetrahedron Letters, vol. 24, No. 18, 1983, pp. 1933-1936.
Tepenitsyna, "Synthesis of Intermediates for Production of Heat Resistant Polymers (Chloromethylation of Diphenyl Oxide)," Zhurnal Prikladnoi Khimii, vol. 40, No. 11, Nov., 1967, pp. 2540-2546.
Crandall Raymond K.
Fuller Timothy J.
Luca David J.
Narang Ram S.
Smith Thomas W.
Berman Susan W.
Byorick Judith L.
Xerox Corporation
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