Process for direct isolation of captopril

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...

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548530, C07D20708

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active

050268732

ABSTRACT:
A process is disclosed for direct isolation of captopril from a substrate of the formula ##STR1## wherein R is lower alkyl or lower alkoxy. In this process, the substrate is first treated with an aqueous alkali metal hydroxide capable of forming a water-soluble salt of the substrate, wherein the alkali metal hydroxide has a concentration of 4M or greater. The substrate is then neutralized, preferably with a mineral acid. By this process, captopril may be directly crystallized from an aqueous solution, avoiding the prior art use of organic solvents and zinc treatment to reduce levels of sulfide and disulfide impurities, respectively. In an alternative embodiment, neutralization is carried out by use of a hydrogen-supplying ion exchange resin.

REFERENCES:
patent: 4105776 (1978-08-01), Ondetti et al.
patent: 4241076 (1980-12-01), Ondetti et al.
patent: 4297282 (1981-10-01), Ohashi et al.
patent: 4332725 (1982-06-01), Fischer et al.
patent: 4332726 (1982-06-01), Korzun
patent: 4460780 (1984-07-01), Ohashi et al.
patent: 4668798 (1987-05-01), Kim
Shimazaki et al., Synthesis of Captopril Starting from an Optically Active .beta.-Hydroxy Acid, Chem. Pharm. Bull. 30(9), 3139-3146 (1982).

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