Process for diffusing impurities into a semiconductor body vapor

Details Process for diffusing impurities into a semiconductor body vapor Process for diffusing impurities into a semiconductor body vapor

1985-03-15

1986-06-03

Ozaki, George T.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

148188, 252951, H01L 21223

Patent

active

045927936

ABSTRACT:
A process for diffusing a dopant into a III-V type semiconductor body is disclosed which comprises:

REFERENCES:
patent: 3374125 (1968-03-01), Goldsmith
patent: 3530016 (1970-09-01), Joseph
patent: 3852128 (1974-12-01), Kreuzer
patent: 3923563 (1975-12-01), Venkatu
patent: 3943016 (1976-03-01), Marcotte
patent: 3948696 (1976-04-01), Inaniwa et al.
patent: 3961996 (1976-06-01), Namizaki et al.
patent: 3984263 (1976-10-01), Asao et al.
patent: 4124417 (1978-11-01), Sirot et al.
patent: 4239560 (1980-12-01), Chang et al.
patent: 4300960 (1981-11-01), Koike et al.
patent: 4312681 (1982-01-01), Rupprecht et al.
patent: 4348428 (1982-09-01), Rockley et al.
patent: 4544417 (1985-10-01), Clarke et al.

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