Process for dielectric stenciled microcircuits

Radiation imagery chemistry: process – composition – or product th – Visible imaging including step of firing or sintering

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430317, 430330, 427 96, G03C 700

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active

043363202

ABSTRACT:
The present invention is directed to a process for complex, high density microcircuits in which thick film dielectric pastes are photolithography patterned into high resolution stencils to produce complementary conductor circuitry patterns, the voids of the developed dielectric stencil are filled with thick film conductor paste, and then there is a cofiring of the conductor and the dielectric. With this new process the number of separate firing operations is reduced. The reduction in the number of firings is important in multilevel hybrid structures.

REFERENCES:
patent: 3443944 (1969-05-01), Wise
patent: 3982941 (1976-09-01), Inskip
patent: 4119480 (1978-10-01), Nishi et al.

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