Process for developing selected positive photoresists

Details Process for developing selected positive photoresists Process for developing selected positive photoresists

1989-09-18

1991-12-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430193, 430309, 430326, 430331, G03C 174, G03F 7023, G03F 732

Patent

active

050699962

ABSTRACT:
The process of developing an image-wise exposed positive-working photoresist-coated substrate comprising the steps of:

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patent: 4711836 (1987-12-01), Ferreira
patent: 4859563 (1989-08-01), Miura et al.
patent: 4863828 (1989-09-01), Kawabe et al.
patent: 4880724 (1989-11-01), Toyama et al.
patent: 4886728 (1989-12-01), Salamy et al.
patent: 4906549 (1990-03-01), Asaumi et al.

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