Process for developing photographic light-sensitive materials fo

Gas separation: apparatus – Electric field separation apparatus – Including gas flow distribution means

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96 66R, G03C 530

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active

041086627

ABSTRACT:
A process for developing a photographic light-sensitive material for the graphic arts which comprises infectiously developing a silver halide light-sensitive material comprising a support having coated thereon a silver halide emulsion layer containing at least 60 mol% silver chloride with an infectious developing solution containing a compound represented by the general formula (I): ##STR1## wherein R.sub.1 and R.sub.2, which may be the same or different, each is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group having up to 12 carbon atoms, or a halogen atom; and n is 1 to 2.

REFERENCES:
patent: 3053657 (1962-09-01), Goodchild et al.
patent: 3190752 (1965-06-01), Hayakawa et al.
patent: 3333959 (1967-08-01), Hayakawa et al.
patent: 3345175 (1967-10-01), Hayakawa et al.
patent: 3573913 (1971-04-01), Willems et al.
patent: 3732104 (1973-05-01), Vandenabeele et al.
patent: 3782945 (1974-01-01), Shimamura et al.
patent: 3827886 (1974-08-01), Ishihra et al.
patent: 3832180 (1974-08-01), Douglas
patent: 3891442 (1975-06-01), Beavers
patent: 3981733 (1976-09-01), Van Dam et al.

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