Process for determining the focussing of a photolithographic app

Details Process for determining the focussing of a photolithographic app Process for determining the focussing of a photolithographic app

1989-12-29

1991-08-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430330, G03C 500

Patent

active

050432362

ABSTRACT:
In a process for determining the focussing of a photolithographic apparatus on a resist-coated wafer, comprising the following steps: 1) insolating, successively in various places, the resist by a test pattern, a different focussing being carried out for each insolation; 2) developing the resist; 3) observing the wafer for determing the optimal insolation and adopting the corresponding setting for the apparatus, it is provided, between steps 2) and 3), the step consisting in heating the wafer up to a temperature higher than the vitreous transition temperature of the resist.

REFERENCES:
patent: 4774158 (1981-03-01), Veavoordeldonic
Dill et al. Thermal Effects on the Photoresist AZ1350J, pp. 210-218, IBM Journal of Research Development vol. 21, No. 3, 5/1977.
Kiyokatsu Jinno et al., "Baking Characteristics of Positive Photoresists" Photographic Science and Engineering, vol. 21, No. 5, Sep./Oct. 1977, pp. 290-292.

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