Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2007-08-28
2007-08-28
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S022000, C355S052000, C355S053000, C355S067000, C355S077000, C356S124000, C356S401000
Reexamination Certificate
active
10800110
ABSTRACT:
A process for providing illumination source conditions for the accurate determination Zernike tilt coefficients in the presence of coma is described. Large feature-shift coma sensitivity is simulated for a range of illumination conditions. The resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified. The optimized set of source shapes can be used to more accurately determine Zernike terms a2 and a3 using a variety of methods. Knowledge of the lens distortion data in the absence of coma induced shifts can be entered into more traditional overlay regression routines to better identify systematic and random error. Additional applications of the above outlined procedure include: improved lithographic simulation using conventional optical modeling software and advanced process control in the form of feedback loops that automatically adjust the projection lens for optimum system performance.
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Bendik Joseph
Hunter, Jr. Robert O.
Smith Adlai H.
Litel Instruments
Young Christopher G.
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