Process for detection of sub-micron particulate contamination on

Details Process for detection of sub-micron particulate contamination on Process for detection of sub-micron particulate contamination on

1990-02-22

1991-10-29

Turner, Samuel

Optics: measuring and testing

By particle light scattering

With photocell detection

356357, 356237, G01B 902

Patent

active

050610686

ABSTRACT:
Particular contamination below about 0.3 microns in average diameter on an IC wafer substrate is detected by forming a film of a volatile liquid on the wafer's surface and observing interference patterns formed by particles during the evaporation process. These interference patterns magnify the "effective" particle size many times, making detection through an optical microscope possible.

REFERENCES:
patent: 3767306 (1973-10-01), Mast et al.

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