Process for detecting fine particles

Details Process for detecting fine particles Process for detecting fine particles

1995-06-01

1997-05-13

Vargot, Mathieu D.

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

21912183, 264409, 438759, H01L 21304

Patent

active

056289545

ABSTRACT:
A process for detecting fine particles includes the steps of forming a sublimable thin film on an essential surface of a wafer on which fine particles are present, irradiating laser beam at the surface of the wafer, receiving a reflected beam from the surface which is scattered by the presence of the fine particles, and detecting the particles from the received scattered beam. The process may further include the step of accomplishing an etchback against the sublimable film to partially retain the sublimable film adjacent the surface of the fine particles. The film can be prepared from one or a mixture of gas including free sulfur generatable gas under discharge-dissociation conditions. Sulfur compounds or polythiazyl are preferable. Alternatively, the film can be made of a condensed film of organic solvent vapor. The sublimable film is sublimed by heating after the step of detecting the fine particles.

REFERENCES:
patent: 5268070 (1993-12-01), Nagayama et al.
patent: 5516369 (1996-05-01), Lur et al.

Affiliated with

Also associated with

Rating

Process for detecting fine particles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for detecting fine particles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for detecting fine particles will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1382856