Process for detecting defects in photomasks through aerial image

Details Process for detecting defects in photomasks through aerial image Process for detecting defects in photomasks through aerial image

1996-08-14

1998-08-18

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 5, 356237, 382144, G01N 2100, G03F 900

Patent

active

057956880

ABSTRACT:
The present invention provides a process for performing automatic inspection of advanced design photomasks. In a preferred embodiment, an aerial image of a portion of a photomask is generated. A simulated image corresponding to original pattern data is also generated. The aerial image and simulated image are then compared and discrepancies are detected as possible defects.

REFERENCES:
patent: 4809341 (1989-02-01), Matsui et al.
patent: 5481624 (1996-01-01), Kamon

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