Process for depositing Tl-containing superconducting thin films

Details Process for depositing Tl-containing superconducting thin films Process for depositing Tl-containing superconducting thin films

1991-03-04

1992-05-19

Beck, Shrive

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

505731, 505732, 427 62, 4271263, 4272553, 427314, 20419224, B05D 512, C23C 1400

Patent

active

051149060

ABSTRACT:
Improvement in a superconducting thin film of a superconducting compound oxide containing thallium (Tl) deposited on a substrate, characterized in that the superconducting thin film is deposited by PVD on {110} plane of a single crystal of magnesium oxide (MgO).

REFERENCES:
Nakao et al., "Sputtered Tl-Ca-Ba-Cu-O Thin films with zero resistivity at 98K", Jpn. J. Appl. Phys. vol. 27 (5) May 1988 L849-851.
Zhou et al., "Preparation of Superconducting Tl.sub.1 Ba.sub.2 Ca.sub.3 Cu.sub.4 O.sub.x Thin films by RF magnetron sputtering", Jpn. J. Appl. Phys. vol. 27(12) Dec. 1988 L2321-2323.
Shih et al., "Multilayer deposition of Tl-Ba-Ca-Cu-O films", Appl. Phys, lett. 53(6) Aug. 1988 pp. 523-525.

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