Process for depositing titanium nitride films

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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Details

42725523, 42725528, 4271261, 427314, C23C 1634

Patent

active

060715626

ABSTRACT:
The present invention provides an efficient process for depositing a titanium nitride film on a substrate. The process comprises the steps of heating the substrate and subsequently exposing the heated substrate to a first gas containing tetrakis(dimethylamido)titanium and to a second gas containing tetrakis(diethylamido)titanium.

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