Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1974-03-29
1976-02-17
Ozaki, G.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148186, 148187, H01L 744
Patent
active
039390179
ABSTRACT:
A novel process for depositing and diffusing an impurity on and into the surface of a number of semiconductor wafers placed in parallel on a quartz boat. The impurity source is formed as a plurality of long and slender bars or a unitary tunnel-shaped element or a plurality of tunnel segments obtained by cutting the element apart. The impurity source as described above is mounted about the periphery of the semiconductor wafers arranged in a row on a quartz boat for reducing the consumption of the impurity source.
REFERENCES:
patent: 2956913 (1960-10-01), Mack et al.
patent: 3314833 (1967-04-01), Arndt et al.
patent: 3362858 (1968-01-01), Knopp
patent: 3374125 (1968-03-01), Goldsmith
patent: 3604694 (1971-09-01), Muller
Inaniwa Keizo
Ryugo Noboru
Sugiyama Akira
Hitachi , Ltd.
Ozaki G.
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