Process for depositing silicon oxide on a substrate

Details Process for depositing silicon oxide on a substrate Process for depositing silicon oxide on a substrate

1988-02-19

1991-10-01

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 427 47, 427162, 427164, 427165, 427166, 427167, B05D 306

Patent

active

050532448

ABSTRACT:
The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

REFERENCES:
patent: 4897284 (1990-01-01), Arai et al.

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