Process for depositing layers on substrates in a vacuum chamber

Details Process for depositing layers on substrates in a vacuum chamber Process for depositing layers on substrates in a vacuum chamber

1986-06-19

1988-06-07

Childs, Sadie L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 47, 4272481, 427249, 4272552, 4272553, B05D 306

Patent

active

047495871

ABSTRACT:
In the previously used methods for the deposition of layers on surfaces by means of chemical reactions with gases, which are introduced into the reaction room or chamber (chemical vapor deposition, CVD), electrical glow discharge and mainly high-frequency discharges were used for the activation of the reactants. According to the invention, the maintaining of a low-voltage arc discharge in the reaction room during the coating is recommended. The surprising result of this is a considerably stronger activation and ionization and a more uniform coating also on surfaces of complex shape.

REFERENCES:
patent: 679926 (1901-08-01), Voelker
patent: 3573098 (1971-03-01), Bieber et al.
patent: 3625848 (1971-12-01), Snaper
patent: 4512867 (1985-04-01), Andreev et al.
patent: 4540596 (1985-09-01), Nimmagadda
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4559121 (1985-12-01), Mularie
patent: 4622452 (1986-11-01), Bergman et al.

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