Process for depositing I-125 onto a substrate used to manufactur

Coating processes – Radioactive base or coating

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4272481, 2504931, B05D 500

Patent

active

047299037

ABSTRACT:
The invention relates to a process for depositing I-125 on a substrate which comprises contacting a predetermined surface area of substrate with Xe-125 gas, whereby the Xe-125 decays to I-125 and the I-125 in turn deposits as a solid on the surface of the substrate, the contact being for a time sufficient to deposit at least about 1 microcurie of I-125. I-125 is thereby deposited in a relatively uniform amount over the surface area of the substrate. The substrate is then assayed to determine how much I-125 has been deposited. The substrate is then divided into pieces of measured surface area, each piece therefore containing a measured amount of deposited I-125, and each piece can then be used in the manufacture of an I-125 source.

REFERENCES:
patent: 3326178 (1967-06-01), DeAngelis
patent: 3711326 (1973-01-01), Parry et al.
patent: 3745067 (1973-07-01), Arino et al.
patent: 3832222 (1974-08-01), Crisler et al.
patent: 4382974 (1983-05-01), Yannopoulos
Large Scale Preparation of High Purity .sup.131 I and .sup.133 Xe by Sorpition Techniques, Case & Acree, Jan. 1966, Oakridge National Laboratory.
Iwamoto et al., Journal of Nuclear Science and Technology, 5, [9], pp. 437-446 (1968).
Richard et al., Journal of Radioanalytical and Nuclear Chemistry, Articles 82/1 (1984), pp. 81-91.
Lin et al., J. Atomic Energy Soc., (Japan), S-182 (1963).
M. L. Good, "The Anion Exchange Separation of Iodine Anions", J. Inorg. Chem., 6, 73 (1958).
Acta. Radiologica, vol. 3, Fasc. 2 (Apr. 1965), pp. 152-160, Beronius et al.

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