Process for depositing finely dispersed organic-inorganic...

Details Process for depositing finely dispersed organic-inorganic... Process for depositing finely dispersed organic-inorganic...

2007-01-16

2007-01-16

Feely, Michael J. (Department: 1712)

Stock material or miscellaneous articles

Composite

Of silicon containing

C428S702000, C428S913000

Reexamination Certificate

active

10248150

ABSTRACT:
A single hybrid organic-inorganic film. The film includes both an organic component, and an inorganic component. The organic component and inorganic component are well interspersed within the film. The film may be incorporated into a multilayer structure including a substrate. A method of forming a hybrid organic-inorganic film. The method includes generating a plasma stream with an expanding thermal plasma generator. The method also includes providing a first reactant and at least one second reactant into the plasma stream extending to a substrate, and forming the hybrid organic-inorganic film on the substrate.

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