Process for depositing a thin layer and product obtained...

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

Reexamination Certificate

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Details

C427S489000, C428S432000, C428S698000, C428S701000, C428S702000, C502S242000, C204S192100

Reexamination Certificate

active

07815977

ABSTRACT:
The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages. In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.

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patent: 2006049865 (2006-05-01), None
Abstract of FR2670506 (English) (1992).

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