Process for depositing a material on a substrate using light ene

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 96, 4273855, 427421, 427475, 427485, 427512, 427557, 427559, 427561, 427582, 427595, 437235, C08F 248

Patent

active

058209425

ABSTRACT:
The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed towards a substrate. The atomized liquid is exposed to light energy which causes the parent material to form a solid coating on a substrate. The light energy can be provided from one or more lamps and preferably includes ultraviolet light. Although the process of the present invention is well suited for use in many different and various applications, one exemplary application is in depositing a dielectric material on a substrate to be used in the manufacture of integrated circuit chips.

REFERENCES:
patent: 3070856 (1963-01-01), Fischbein
patent: 3501334 (1970-03-01), Flaherty
patent: 3518110 (1970-06-01), Fischbein
patent: 3589606 (1971-06-01), Fish
patent: 3652342 (1972-03-01), Fischbein et al.
patent: 3969978 (1976-07-01), Seifert et al.
patent: 4012551 (1977-03-01), Bogaty et al.
patent: 4264790 (1981-04-01), Zlevor
patent: 4296208 (1981-10-01), Gagliani et al.
patent: 4305796 (1981-12-01), Gagliani et al.
patent: 4404256 (1983-09-01), Anand et al.
patent: 4430978 (1984-02-01), Lewis et al.
patent: 4495889 (1985-01-01), Riley
patent: 4532620 (1985-07-01), Matsuda et al.
patent: 4562088 (1985-12-01), Navarro
patent: 5048163 (1991-09-01), Asmus et al.
patent: 5068210 (1991-11-01), DiLazzaro et al.
patent: 5134961 (1992-08-01), Giles et al.
patent: 5175433 (1992-12-01), Browner et al.
patent: 5196062 (1993-03-01), Bergmann et al.
patent: 5204289 (1993-04-01), Moh
patent: 5230740 (1993-07-01), Pinneo
patent: 5238471 (1993-08-01), Blanchet-Fincher
patent: 5312790 (1994-05-01), Sengupta et al.
patent: 5356668 (1994-10-01), Paton et al.
patent: 5361800 (1994-11-01), Ewin
patent: 5371403 (1994-12-01), Huang et al.
patent: 5393712 (1995-02-01), Rostoker et al.
patent: 5451260 (1995-09-01), Versteeg et al.
patent: 5540772 (1996-07-01), McMillan et al.
"Notes on Drying Paints by Radian Heat", pp. 1-20, ICI Limited (no date available).
DuPont Teflon AF amorphous Fluoropolymer brochure, Wilmington, Delaware (no date available).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for depositing a material on a substrate using light ene does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for depositing a material on a substrate using light ene, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for depositing a material on a substrate using light ene will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-311407

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.