Process for depositing a conductive oxide layer

Details Process for depositing a conductive oxide layer Process for depositing a conductive oxide layer

1985-02-01

1987-03-24

Childs, Sadie L.

Coating processes

Electrical product produced

Welding electrode

427 541, 427 85, 427 87, 427 99, 4271262, 4271263, 427162, 427166, 427255, 4272553, 4272557, 4274192, B05D 306

Patent

active

046524630

ABSTRACT:
The specification discloses a low-temperature process for depositing a layer of a conductive oxide of a chosen metal, such as tin oxide, on the surface of a substrate while simultaneously avoiding damage to the substrate. The process comprises exposing the substrate to a selected vapor phase reactant containing the chosen metal, such as tetramethyl tin, in the presence of neutral, charge-free oxygen atoms formed in a manner which avoids the generation of charged particles and high energy radiation that would damage the substrate. The oxygen atoms react with the vapor phase reactant to form the conductive oxide, which deposits as a layer on the surface of the substrate. In a preferred process embodiment, the neutral oxygen atoms are photochemically generated. This process is especially useful for depositing a layer of a transparent conductive oxide on the surface of a radiation-hardened device while maintaining the radiation-hardness of the device.

REFERENCES:
patent: 4206252 (1980-06-01), Gordon
patent: 4265932 (1981-05-01), Peters et al.
patent: 4265974 (1981-05-01), Gordon
patent: 4267205 (1981-05-01), Pastor et al.
patent: 4352834 (1982-10-01), Taketoshi et al.
patent: 4371587 (1983-02-01), Peters
patent: 4409260 (1983-10-01), Pastor et al.
patent: 4419385 (1983-12-01), Peters
patent: 4474829 (1984-10-01), Peters

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