Compositions – Radioactive compositions – Nuclear reactor fuel
Patent
1983-11-17
1986-12-09
Lechert, Jr., Stephen J.
Compositions
Radioactive compositions
Nuclear reactor fuel
210729, 210749, 210903, 252626, 252634, 423 11, 423 12, G21F 904, G21F 910, B01D 2101
Patent
active
046279377
ABSTRACT:
A process for denitrating aqueous, nitric acid and salt containing waste solutions in which actinides are present, with simultaneous separation of the actinides, comprises agitating the waste solution at room temperature with diethyl oxalate and heating the resulting suspension to at least 75.degree. C.
REFERENCES:
patent: 3158577 (1964-11-01), Bray et al.
patent: 3258429 (1966-06-01), Weed
patent: 3673086 (1972-06-01), Drobnik
patent: 3725293 (1973-04-01), Haas
patent: 4025602 (1977-05-01), Campbell et al.
patent: 4056482 (1977-11-01), Schmieder et al.
patent: 4162230 (1979-07-01), Horwitz et al.
patent: 4290967 (1981-09-01), Campbell et al.
patent: 4364859 (1982-12-01), Ohtsuka et al.
patent: 4421533 (1983-12-01), Nishino et al.
patent: 4442071 (1984-04-01), Lieser et al.
patent: 4490336 (1984-12-01), Worthington et al.
Chemical Abstracts, vol. 50, 1956; I. A. Mirkin et al., col. 13576 g to i, and col. 13577 a.
R. C. Forsman et al., "Formaldehyde Treatment of Purex Radioactive Wastes" AEC-Report, HW-79622, Oct. 1963.
Helmut Richter et al., "Zerstorung des Salpetersaureuberschuss In Radioaktiven Abfallosungen und Verfestigung des Ruckstandes Als Alkydharz" SGAE Report No. 2252 ST-23/74, Mar. 1974.
Kernforschungszentrum Karlsruhe GmbH
Lechert Jr. Stephen J.
Locker Howard J.
LandOfFree
Process for denitrating nitric acid and actinide containing wast does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for denitrating nitric acid and actinide containing wast, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for denitrating nitric acid and actinide containing wast will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1384599