Distillation: processes – separatory – Distilling to separate or remove only water – From organic compound
Patent
1990-10-15
1992-08-11
Manoharan, Virginia
Distillation: processes, separatory
Distilling to separate or remove only water
From organic compound
203 67, 203 69, 203 87, 203 98, B01D 336
Patent
active
051376059
ABSTRACT:
A process for the dehydration of substances, mixtures, primarily condensation reaction mixtures, (e.g. direct esterification, direct acetal formation, direct ketal formation), performed by continuous azeotropic distillation with an organic solvent forming with water an azeotropic mixture of minimal boiling point and unable to mix with water, carried out in such a way that the distillate is cooled at least to the temperature, at which the condensate with the given water content or the organic phase of the condensate is just supersaturated with respect to water, and the organic phase of lower water content obtained in this way is recycled to the distilling boiler. The organic solvents used are e.g. benzene, toluene, 1,2-dichloroethane, chloroform, carbon tetrachloride.
REFERENCES:
patent: 1862706 (1932-06-01), Ricard et al.
patent: 2043178 (1936-07-01), Carney
patent: 2362093 (1944-11-01), Pyzel et al.
patent: 3663631 (1972-05-01), Takeya et al.
patent: 3669847 (1972-06-01), Feder et al.
patent: 3687819 (1972-08-01), Levin
patent: 3855077 (1974-12-01), Bieser et al.
patent: 4115208 (1978-09-01), Verstegen
Greiner Istvan
Stefko Bela
Szilbereky Jeno
Thaler Gyorgy
Dubno Herbert
Manoharan Virginia
Myers Jonathan
Richter Gedeon Vegyeszeti Gyar Rt.
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