Process for decreasing the level of impurities in zirconium chlo

Details Process for decreasing the level of impurities in zirconium chlo Process for decreasing the level of impurities in zirconium chlo

1991-05-22

1992-12-15

Morris, Theodore

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group ivb metal

423 69, 423 72, 423 75, 423 76, 423 81, 423147, 423149, 423324, 423341, 423492, 423210, C01G 2300, C01G 2500, C01G 2700

Patent

active

051715490

ABSTRACT:
An improved halogenator process and system is provided which significantly and economically decreases the level of impurities in the processing of various refractory metals and their halides and particularly hafnium tetrachloride which is condensed from gases produced by the chlorination of Zircon.

REFERENCES:
patent: 2184884 (1939-12-01), Muskat et al.
patent: 3989510 (1976-11-01), Othmer
patent: 4840774 (1989-06-01), Campbell et al.
patent: 4979967 (1990-12-01), Walter et al.

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