Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – Using direct contact with electrical or electromagnetic...
Reexamination Certificate
2008-01-08
2010-12-21
Conley, Sean E (Department: 1773)
Chemical apparatus and process disinfecting, deodorizing, preser
Process disinfecting, preserving, deodorizing, or sterilizing
Using direct contact with electrical or electromagnetic...
C250S455110, C250S493100
Reexamination Certificate
active
07854889
ABSTRACT:
A process for decontamination by radiation of a product. The process comprises at least one exposing step during which at least a first part of the product is exposed to a first radiation level, and at least a second part of the product is exposed to a second radiation level. The invention also relates to an equipment suitable for such a process.
REFERENCES:
patent: 2724059 (1955-11-01), Gale
patent: 2957078 (1960-10-01), Gale
patent: 4010374 (1977-03-01), Ramler
patent: 4652763 (1987-03-01), Nablo
patent: 5496302 (1996-03-01), Minshall et al.
patent: 6203755 (2001-03-01), Odland
patent: 2005/0078789 (2005-04-01), Miller
patent: 2006/0054523 (2006-03-01), Porret et al.
patent: 2 055 321 (2009-05-01), None
patent: WO 2004/110157 (2004-12-01), None
patent: WO 2004/110157 (2004-12-01), None
International Search Report for International Application No. PCT/US2008/000256 dated Oct. 16, 2008.
European Search Report, EP 2 055 321 A1, Dated Mar. 23, 2009.
Becton Dickinson and Company
Cohen Pontani Lieberman & Pavane LLP
Conley Sean E
Fortunato David M.
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