Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1974-12-04
1976-07-13
Rutledge, L. Dewayne
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423240, 423484, C01B 3318
Patent
active
039694852
ABSTRACT:
A process is provided for converting silicon and fluorine-containing waste gases into silicon dioxide and hydrogen fluoride, absorbing the waste gases in water to form hydrofluosilicic acid, decomposing the hydrofluosilicic acid in the presence of concentrated sulfuric acid to form silicon tetrafluoride and hydrogen fluoride, converting the silicon tetrafluoride in the vapor phase to silica and hydrogen fluoride, and recovering the hydrogen fluoride.
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patent: 2819151 (1958-01-01), Flemmert
patent: 3203759 (1965-08-01), Flemmert
patent: 3218124 (1965-11-01), Oakley
patent: 3273963 (1966-09-01), Gunn
patent: 3660025 (1972-05-01), Driscoll
patent: 3661519 (1972-05-01), Driscoll
Brescia, F., et al. Fundamentals of Chemistry, Academic Press, N.Y., (1966) p. 319.
Lewis Michael L.
Rutledge L. Dewayne
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