Process for converting silicon-and-fluorine-containing waste gas

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423240, 423484, C01B 3318

Patent

active

039694852

ABSTRACT:
A process is provided for converting silicon and fluorine-containing waste gases into silicon dioxide and hydrogen fluoride, absorbing the waste gases in water to form hydrofluosilicic acid, decomposing the hydrofluosilicic acid in the presence of concentrated sulfuric acid to form silicon tetrafluoride and hydrogen fluoride, converting the silicon tetrafluoride in the vapor phase to silica and hydrogen fluoride, and recovering the hydrogen fluoride.

REFERENCES:
patent: 1960347 (1934-05-01), Osswald
patent: 2819151 (1958-01-01), Flemmert
patent: 3203759 (1965-08-01), Flemmert
patent: 3218124 (1965-11-01), Oakley
patent: 3273963 (1966-09-01), Gunn
patent: 3660025 (1972-05-01), Driscoll
patent: 3661519 (1972-05-01), Driscoll
Brescia, F., et al. Fundamentals of Chemistry, Academic Press, N.Y., (1966) p. 319.

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