Process for controlling mobile ion contamination in semiconducto

Details Process for controlling mobile ion contamination in semiconducto Process for controlling mobile ion contamination in semiconducto

1984-12-14

1987-07-14

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

29571, 148 15, 148187, 148DIG24, 148DIG61, 357 91, H01L 2120, B01J 1700

Patent

active

046793089

ABSTRACT:
The present invention provides a method of protecting semiconductor integrated circuit from mobile ion contamination. In one embodiment a gettering agent is implanted into a dielectric layer. In an alternative embodiment a gettering agent is implanted into a photoresist layer which is ashed in an oxygen based plasma, leaving the gettering agent on the surface underlying the photoresist.

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El-Kareh, IBM-TDB, 27 (1984), 3036.

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