Process for controlling exposure dose or focus parameters using

Details Process for controlling exposure dose or focus parameters using Process for controlling exposure dose or focus parameters using

1997-08-28

1999-11-02

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 30, G03F 900

Patent

active

059767405

ABSTRACT:
Focus and exposure parameters may be controlled in a lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate. Corresponding dimensions of the resist shape and space are measured and the adequacy of focus or exposure dose are determined as a function of the measured dimensions. Etching parameters may also be controlled by creating a complementary tone pattern of etched shapes and spaces on a substrate. Corresponding dimensions of the etched shape and space are measured and the adequacy of etching parameters are determined as a function of the measured dimensions.

REFERENCES:
patent: 3689162 (1972-09-01), Ferguson
patent: 4529314 (1985-07-01), Ports
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
patent: 4568789 (1986-02-01), Bass et al.
patent: 4596037 (1986-06-01), Bouchard et al.
patent: 4659936 (1987-04-01), Kikkawa et al.
patent: 4783826 (1988-11-01), Koso
patent: 4820005 (1989-04-01), Muller
patent: 4853967 (1989-08-01), Manderville
patent: 4893346 (1990-01-01), Bishop
patent: 4908656 (1990-03-01), Suwa et al.
patent: 4908871 (1990-03-01), Hara et al.
patent: 4981372 (1991-01-01), Morimoto et al.
patent: 5103104 (1992-04-01), Tissier et al.
patent: 5119436 (1992-06-01), Holdgrafer
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5262258 (1993-11-01), Yanagisawa
patent: 5272763 (1993-12-01), Maruyama et al.
patent: 5309198 (1994-05-01), Nakagawa
patent: 5386294 (1995-01-01), Ototake et al.
patent: 5402224 (1995-03-01), Hirukawa et al.
patent: 5418613 (1995-05-01), Matsutani
patent: 5483345 (1996-01-01), Donaher et al.
patent: 5629772 (1997-05-01), Ausschnitt
Electrical Measurements For Characterizing Lithography, VSLI Electronics Microstructure Science, by Christopher P. Ausschnitt, Vol. 16, pp. 320-356, 1987.

Affiliated with

Also associated with

Rating

Process for controlling exposure dose or focus parameters using does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for controlling exposure dose or focus parameters using , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for controlling exposure dose or focus parameters using will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2132694