Coating apparatus – Gas or vapor deposition – Running length work
Patent
1995-06-02
1996-05-28
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Running length work
118723MW, 118723ME, 20429824, 20429838, C23C 1600
Patent
active
055207405
ABSTRACT:
A method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma.
An apparatus suitable for practicing said method.
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Translation of Japanese Application JP 61288074.
Echizen Hiroshi
Fujioka Yasushi
Kanai Masahiro
Kariya Toshimitsu
Matsuyama Jinsho
Breneman R. Bruce
Canon Kabushiki Kaisha
Chang Joni Y.
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