Process for continuously forming a large area functional deposit

Details Process for continuously forming a large area functional deposit Process for continuously forming a large area functional deposit

1995-05-25

1998-02-03

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118723MR, 118723MA, C23C 1600

Patent

active

057140103

ABSTRACT:
A microwave plasma CVD method for continuously forming a large area and length functional deposited film, the method comprises: continuously moving a substrate web in the longitudinal direction by paying out it by a pay-out mechanism and taking up it by a take-up mechanism; establishing a substantially enclosed film-forming chamber by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving from said pay-out mechanism toward said take-up mechanism; introducing a film-forming raw material gas through a gas feed means into said film-forming chamber; at the same time, radiating a microwave energy in said film-forming chamber by using a microwave applicator means, which is so designed that it can radiate a microwave energy in the direction parallel to the microwave propagating direction, to generate microwave plasma in said film-forming chamber, whereby continuously forming a deposited film on the inner wall face of said continuously moving circumferential wall to be exposed to said microwave plasma.
A microwave plasma CVD apparatus suitable practicing said method.

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