Compositions – Electrolytes for electrical devices
Patent
1979-12-17
1983-01-25
Metz, Andrew
Compositions
Electrolytes for electrical devices
72 42, 252 333, 252 407, 252 58, C10M 516
Patent
active
043702449
ABSTRACT:
An improved process for cold mechanical working of metallic materials is disclosed, in which a lubricant containing salts of carboxylic acids with more than ten, and preferably 15 to 20, carbon atoms. The lubricant also contains at least one organic solvent with a boiling point below 200.degree. C., and preferably at least one organic solvent with a boiling point below 30.degree. C. In a preferred embodiment, tensides are added to reduce surface tension. The lubricant combines the advantages of solid and liquid lubricants, and permits the cold mechanical working of materials with high tensile strength.
REFERENCES:
patent: 2995516 (1961-08-01), Stine et al.
patent: 3019190 (1962-01-01), Holzinger
patent: 3071544 (1963-01-01), Rue
patent: 3123561 (1964-03-01), Rue
patent: 3287264 (1966-11-01), Topper
patent: 3311555 (1967-03-01), Ehrlenspiel et al.
patent: 3367866 (1968-02-01), Cook et al.
patent: 3705852 (1972-12-01), Fischer
patent: 3723313 (1973-03-01), Churn
patent: 3897349 (1975-07-01), Marin
patent: 3909431 (1975-09-01), Figiel
patent: 3928215 (1975-12-01), Dreher et al.
patent: 3953344 (1976-04-01), Narushima
patent: 3992303 (1976-11-01), Barker et al.
patent: 4193881 (1980-03-01), Baur
patent: 4201681 (1980-05-01), Lipinski et al.
Koch Gerhard
Kurze Bernhard
Vogel Heinz-Rudiger
Weinhold Harri
Akademie der Wissenschaften der DDR
Metz Andrew
Striker Michael J.
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