Process for coating three-dimensional substrates with thin...

Coating processes – Spraying

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S002100, C427S533000, C427S294000, C427S295000, C427S296000, C427S226000, C427S227000, C427S228000, C427S229000, C427S248100

Reexamination Certificate

active

10927782

ABSTRACT:
The present invention relates to an apparatus and process for producing a thin organic film on a substrate using an ultrasonic nozzle to produce a cloud of micro-droplets in a vacuum chamber. The micro-droplets move turbulently within the vacuum chamber, isotropically impacting and adhering to the surface of the substrate. The resulting product has a smooth, continuous, conformal, and uniform organic thin film, when the critical process parameters of micro-droplet size, shot size, vacuum chamber pressure, and timing are well-controlled, and defects such as “orange peel” effect and webbing are avoided. The apparatus includes an improved ultrasonic nozzle assembly that comprises vacuum sealing and a separate, independent passageway for introducing a directed purging gas.

REFERENCES:
patent: 4504522 (1985-03-01), Kaiser et al.
patent: 4808449 (1989-02-01), McAlister
patent: 5451260 (1995-09-01), Versteeg et al.
patent: 5821402 (1998-10-01), Okajima et al.
patent: 5834419 (1998-11-01), McFadden et al.
patent: 5972430 (1999-10-01), DiMeo, Jr. et al.
patent: 6131580 (2000-10-01), Ratner et al.
patent: 6134791 (2000-10-01), Huang
patent: 6153252 (2000-11-01), Hossainy et al.
patent: 6265222 (2001-07-01), DiMeo, Jr. et al.
patent: 6361819 (2002-03-01), Tedeschi et al.
patent: 6596236 (2003-07-01), DiMeo, Jr. et al.
patent: 6670286 (2003-12-01), Yang et al.
patent: 2003/0161937 (2003-08-01), Leiby et al.
Krumdieck et al., “Conversion efficiency of alkoxide precursor to oxide films grown by an ultrasonic-assisted, pulsed liquid injection, metalorganic chemical vapor deposition (pulsed-cvd) process”,J.Am. Ceram. Soc., 82:1605-1607, 1999.
Krumdieck, “Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor”,Acta Mater., 49:583-588, 2001.
Leiby, “A better way to produce thin-film protypes: a recent twist to chemical vapor deposition provides a versatile way to create thin-film circuits and other devices; Engineering Materials,”Machine Design, 75:114, 2003.
Leiby, “Chemical vapor deposition by pulsed ultrasonic direct injection of liquid precursors produces versatile method for creation of thin film circuits and devices,” apparently available on thinsonic-cvd.com in Jun. 2002.
Schmidmaier, et al., “Biodegradable poly(d,l-lactide) coating of implants for continuous release of growth factors”, J. Biomed Mater Res. (Appl Biomater), 58:449-455, 2001.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for coating three-dimensional substrates with thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for coating three-dimensional substrates with thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for coating three-dimensional substrates with thin... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3746064

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.