Process for coating synthetic optical substrates

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

427164, 4272481, 427322, B05D 306, B05D 506

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active

048159620

ABSTRACT:
A process for coating a synthetic resin optical substrate by subjecting the surface of the substrate to low temperature ion bombardment prior to coating in order to open the chemical bonds on the surface of the substrate and coating the substrate surface before the bonds return to their normal or closed condition. The substrate may also be subjected to low temperature ion bombardment during and after coating to further improve coating adherence and abrasion resistance characteristics.

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patent: 4478873 (1984-10-01), Masso et al.
patent: 4485124 (1984-11-01), Ciparisso
patent: 4599272 (1986-07-01), Ichikawa
patent: 4654231 (1987-03-01), Nyberg et al.
"Ion Beam Processing for Coating MgF.sub.2 Onto Ambient Temperature Substrates", Charles M. Kennemore III and Ursula J. Gibson, Applied Optics, vol. 23, No. 20, Oct. 15, 1984.
"Ion-Assisted Deposition of MgF.sub.2 at Ambient Temperatures", C . J. Gibson and C. M. Kennemore III, Thin Solid Films, 124 (1985), 27-33.

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