Process for coating substrates using vapour deposition

Details Process for coating substrates using vapour deposition Process for coating substrates using vapour deposition

2007-05-22

2007-05-22

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S250000, C427S255280

Reexamination Certificate

active

10333039

ABSTRACT:
The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions.

REFERENCES:
patent: 4533383 (1985-08-01), Miura et al.
patent: 4888211 (1989-12-01), Oka et al.
patent: 5104634 (1992-04-01), Calcote
patent: 5256205 (1993-10-01), Schmitt et al.
patent: 5411591 (1995-05-01), Izu et al.
patent: 5725672 (1998-03-01), Schmitt et al.
patent: 5728224 (1998-03-01), Laurent et al.
patent: 5874131 (1999-02-01), Vaartstra et al.
patent: 5919310 (1999-07-01), Fujioka et al.
patent: 6165554 (2000-12-01), Halpern et al.
patent: 6190732 (2001-02-01), Omstead et al.
patent: 6230731 (2001-05-01), Miller et al.
patent: 6309508 (2001-10-01), Lemme et al.
patent: 6409837 (2002-06-01), Hillman
patent: 6576061 (2003-06-01), Moriyama et al.
patent: 6804285 (2004-10-01), Ohmi et al.
patent: 10 10 720 (1998-12-01), None
patent: 28 07 803 (1978-09-01), None
patent: WO 97/47782 (1997-12-01), None

Affiliated with

Also associated with

Rating

Process for coating substrates using vapour deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for coating substrates using vapour deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for coating substrates using vapour deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3775104