Process for cleaning silicon surface and fabrication of thin...

Details Process for cleaning silicon surface and fabrication of thin... Process for cleaning silicon surface and fabrication of thin...

2006-01-31

2006-01-31

Thompson, Craig A. (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C134S001300

Reexamination Certificate

active

06992017

ABSTRACT:
A process for cleaning a silicon surface. First, a silicon surface is cleaned with an oxidant solution. Next, the silicon surface is rinsed with HF vapor or liquid and then with the silicon surface with hydrogen water or deionized water under megasonic agitation. Finally, the silicon surface is cleaned with an oxidant solution a second time. The present inventive cleaning process can be applied in thin film transistor (TFT) fabrication and the TFT obtained has higher electron mobility.

REFERENCES:
patent: 4693759 (1987-09-01), Noguchi et al.
patent: 5346833 (1994-09-01), Wu
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5954885 (1999-09-01), Ohmi
patent: 6099662 (2000-08-01), Wang et al.
patent: 6240933 (2001-06-01), Bergman
patent: 6332835 (2001-12-01), Nishimura et al.
patent: 6346505 (2002-02-01), Morita et al.
patent: 6348157 (2002-02-01), Ohmi et al.
patent: 6500736 (2002-12-01), Kim et al.
patent: 6559036 (2003-05-01), Ohtani et al.
patent: 6627001 (2003-09-01), Chen
patent: 6689645 (2004-02-01), Houng et al.
patent: 2001/0017143 (2001-08-01), Bergman
patent: 2002/0005214 (2002-01-01), Tomita et al.
patent: 2002/0102775 (2002-08-01), Houng et al.
patent: 2002/0137266 (2002-09-01), Moon et al.
patent: 2002/0173173 (2002-11-01), Kobayashi et al.
patent: 2003/0000548 (2003-01-01), Tsuga et al.
patent: 2004/0106240 (2004-06-01), Peng et al.
patent: 426874 (2001-03-01), None
patent: 464972 (2001-11-01), None

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