Process for cleaning silicon mass and the recovery of nitric aci

Cleaning and liquid contact with solids – Processes – Including regeneration – purification – recovery or separation...

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134 3, 134 12, 134 30, B08B 304

Patent

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053465571

ABSTRACT:
In a process for cleaning a silicon mass with a acid washing solution, a waste solution containing a mixed acid composed of nitric acid and hydrofluoric acid is introduced to a distillation step, and hydrofluoric acid is introduced to a distillation cooling portion to prevent precipitation of silicon dioxide. The waste cleaning liquor is distilled to recover nitric acid.

REFERENCES:
patent: 4695327 (1987-09-01), Grebinski
patent: 4971654 (1990-10-01), Schnegg et al.

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