Process for cleaning quartz and silicon surfaces

Details Process for cleaning quartz and silicon surfaces Process for cleaning quartz and silicon surfaces

1992-02-03

1993-11-09

Morris, Theodore

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 38, B08B 304, B08B 308, C03C 2300, C23G 100

Patent

active

052598888

ABSTRACT:
A process for cleaning quartz and silicon surfaces by removing inorganic substances from said surfaces which comprises contacting the surface to be cleaned with a liquid at a temperature and for a period of time effective to remove said substances from the surface, said liquid comprising a solution in a solvent of at least one quaternary ammonium hydroxide characterized by the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each independently alkyl groups containing from 1 to about 10 carbon atoms, aryl groups, or R.sub.1 and R.sub.2 are alkylene groups which together with the nitrogen atom may form an aromatic or non-aromatic heterocyclic ring provided that if the heterocyclic group contains a --C.dbd.N-- bond, R.sub.3 is the second bond.

REFERENCES:
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patent: 4202703 (1980-05-01), Zuber et al.
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4556629 (1985-12-01), Poulin et al.
patent: 4592856 (1986-06-01), Kobayashi et al.
patent: 4714530 (1987-12-01), Hale et al.
patent: 4744834 (1988-05-01), Haq
patent: 4914006 (1990-04-01), Kato et al.
"Quartzware Cleaning Technology" in Solid State Technology, vol. 31, No. 1, Jan. 1988, pp. 79-80.

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