Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1992-11-13
1995-01-03
Fuller, Benjamin R.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423241, C01B 707
Patent
active
053784448
ABSTRACT:
There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.
REFERENCES:
patent: 4594231 (1986-06-01), Nishino et al.
patent: 4861578 (1989-08-01), Fukunaga et al.
patent: 5030610 (1991-07-01), Sakata et al.
Database WPIL Section Ch, Week 8128, Derwent Publications Ltd., London, GB; Class E36, AN 81-51190D & SU-A-774 575 (Budkina) 31 Oct. 1981 (Abstract).
Database WPIL Section Ch, Week 9114, Derwent Publications Ltd., London, GB; Class E36, AN 91-097640 & JP-A-3 040 901 (Nippon Pionics KK) 21, Feb. 1991 (Abstract) & Patent Abstracts of Japan, vol. 015, No. 173 (C-0828), May 2, 1991 (Abstract).
Database WPIL Section Ch, Week 9017, Derwent Publications Ltd., London, GB; Class E36, AN 90-127715 & JP-A-2 075 318 (Nippon Pionics KK) Mar. 15, 1990 (Abstract) & Patent Abstracts of Japan, vol. 014, No. 261 (C-0725), Jun. 6, 1990 (Abstract).
Akita Noboru
Hatakeyama Toshiya
Iwata Keiichi
Shimada Takashi
Fuller Benjamin R.
Japan Pionics Co., Ltd.
Lund Valerie Ann
LandOfFree
Process for cleaning harmful gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for cleaning harmful gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for cleaning harmful gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2209714