Process for cleaning harmful gas

Details Process for cleaning harmful gas Process for cleaning harmful gas

1993-10-28

1995-05-23

Langel, Wayne

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Nitrogen or nitrogenous component

423240S, 423489, B01D 5354

Patent

active

054179483

ABSTRACT:
There is disclosed a process for cleaning a gas containing a nitrogen fluoride especially nitrogen trifluoride as the harmful component which comprises bringing the gas into contact with a cleaning agent comprising zirconium or a zirconium-based alloy such as Zr-Fe, Zr-Cu, Zr-Ni, Zr-Al, Zr-Mg, Zr-Ca, Zr-Zn, Zr-La and Zr-Ce to remove the harmful component at 100.degree. to 800.degree. C., especially 150.degree. to 500.degree. C. The process is capable of efficiently removing nitrogen fluoride, especially nitrogen trifluoride at a relatively low temperature without generating a harmful byproduct such as nitrogen oxide, and thus exhibits excellent effect on the cleaning of exhaust gas from semiconductor manufacturing process, etc.

REFERENCES:
patent: 4339309 (1982-07-01), Pruett et al.
patent: 4629611 (1986-12-01), Fan
patent: 4960581 (1990-10-01), Harada et al.
patent: 4983373 (1991-01-01), Withers, Jr. et al.
Patent Abstracts of Japan, vol. 16, No. 431, 9 Sep. 1992 of JP-A-04 149 010, 22 May 1992.

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