Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1994-09-19
1997-01-28
Lewis, Michael
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423240S, C01B 707, B01D 5368
Patent
active
055975402
ABSTRACT:
There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.
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DATABASE WPIL Section Ch, Week 9114, Derwent Publications Ltd., London, GB; Class E36, AN 91-097640 of JP-A-3 040 901 (NIPPON PIONICS KK) 21, Feb. 1991, (ABSTRACT) & PATENT ABSTRACTS OF JAPAN, vol. 015, No. 173 (C-0828), May 2, 1991 (ABSTRACT).
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Akita Noboru
Hatakeyama Toshiya
Iwata Keiichi
Shimada Takashi
DiMauro Peter T.
Japan Pionics Co., Ltd.
Lewis Michael
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