Process for cleaning harmful gas

Details Process for cleaning harmful gas Process for cleaning harmful gas

1994-05-12

1996-04-30

Lewis, Michael

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Organic component

423210, B01D 5364, B01D 5372

Patent

active

055122620

ABSTRACT:
A process for cleaning a harmful gas which includes contacting a gas containing as a harmful component an alkoxide compound of the formula M(OR).sub.x, wherein M is a metallic element, OR is an alkoxy group and x is the valency of the metal, such as trimethylphosphorous, with a cleaning agent, which is an alkali metal compound such as potassium hydroxide, sodium hydroxide and potassium oxide, supported on a metallic oxide composition comprising cupric oxide and manganese dioxide, wherein the total amount of the cupric oxide and the manganese dioxide is at least 60% by weight based on the total amount of the metallic oxide, to remove the harmful component from the harmful gas. The process effectively and safely removes harmful components in gases exhausted from semiconductor manufacturing processes.

REFERENCES:
patent: 4535072 (1985-08-01), Kitayama et al.
patent: 4910001 (1990-03-01), Kitahara et al.
patent: 4976933 (1990-12-01), Mungall et al.
patent: 5213767 (1993-05-01), Smith et al.

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