Process for cleaning a substrate using a barrier discharge

Details Process for cleaning a substrate using a barrier discharge Process for cleaning a substrate using a barrier discharge

1996-01-17

1997-12-16

McMahon, Timothy

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 12, 134 13, 134 2, 20429802, 2041921, B08B 700, C23C 1400

Patent

active

056980396

ABSTRACT:
A barrier discharge device (4a, 4b, 4c) installed in a vacuum chamber (1) consists essentially of at least two facing electrodes (20, 22); a dielectric (22) situated between the electrodes (20, 22) and in the immediate proximity of one of these electrodes (20); and a power source (26), which is connected electrically to the electrodes (20, 22). The plasma particles and UV radiation generated during the electrical discharge between the electrodes (20, 22) pass through the electrode (22), which is permeable to UV radiation and plasma particles, and thus emerge from the discharge space. On the surfaces (5a, 5b), the UV radiation induces a photochemical cleaning process, and the impinging plasma particles induce a plasma-chemical cleaning process. The cleaning process is essentially independent of pressure and can be used at pressures of up to 10 bars, which means that the cleaning process can be operated in particular during the time in which the vacuum chamber (1) is being pumped out.

REFERENCES:
patent: 5173638 (1992-12-01), Eliasson et al.
patent: 5427747 (1995-06-01), Kong et al.
patent: 5444331 (1995-08-01), Matsuno et al.
patent: 5458856 (1995-10-01), Marie et al.
patent: 5510158 (1996-04-01), Hiramoto et al.
patent: 5581152 (1996-12-01), Matsuno et al.
Volkova et al. "Vacuum-Ultraviolet Lamps with a Barrier Discharge in Inert ases" Journal of Applied Spectroscopy, vol. 41, No. 4, pp. 1194-1197 (Oct. 1984).

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