Organic compounds -- part of the class 532-570 series – Organic compounds – Amino nitrogen containing
Patent
1999-01-07
2000-07-11
Barts, Samuel
Organic compounds -- part of the class 532-570 series
Organic compounds
Amino nitrogen containing
564485, 570189, 570217, C07C20900
Patent
active
060875356
ABSTRACT:
This invention provides an improved process for the preparation of chloroalkynes from alkynyl alcohols. The chloroalkynes can be employed to prepare alkynyl amines which are useful for the manufacture of biologically active materials. The present invention reduces the hazards of the chlorination reaction, eliminates or greatly reduces by-product formation, and provides certain environmental benefits.
REFERENCES:
patent: 2766285 (1956-10-01), Hennion et al.
patent: 5254584 (1993-10-01), Michelotti et al.
Stammann, et al., Umsetzung von 3-Chlor-3-methyl-1-butin mit Chlorwasserstoff: Hinweise gegen eine elektrophile Additionsreaktion, Chemische Berichte, vol. 113, 3103-3111 (1980) (No translation).
Hennion, et al., Sterically Crowded Amines. IV. Secondary and Tertiary Bispropargylic Amines and Their Hydrogenation Products, J. Org. Chem., vol. 30, 2645-2650 (1965) month unavailable.
Hennion, et al., The Preparation of Some Acetylenic Primary Amines, J. Am. Chem. Soc., 75, 1653 (1953).
Hennion, et al., Preparation of t-Acetylenic Chlorides, J. Org. Chem., 26, 725 (1961).
Kopka, et al., Preparation of a Series of Highly Hindered Secondary Amines, Including Bis(triethylcarbinyl)amine, J. Org. Chem., 45, 4616 (1980).
Gross Andrew William
Mosley David Wayne
Roemmele Renee Caroline
Barts Samuel
Carpenter Clark R.
Rohm and Haas Company
LandOfFree
Process for chloroalkynes and alkynyl amines does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for chloroalkynes and alkynyl amines, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for chloroalkynes and alkynyl amines will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-543708