Process for chemical vapor deposition of transition metal nitrid

Details Process for chemical vapor deposition of transition metal nitrid Process for chemical vapor deposition of transition metal nitrid

1989-11-30

1992-08-18

Lusignan, Michael

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427255, 4272551, 427314, 423411, C23C 1634, C23C 1646

Patent

active

051398257

ABSTRACT:
A process for depositing a thin film of a transition metal nitride, e.g., titanium nitride, on a substrate is provided. The vapors of a transition metal organometallic coompound or a transition metal amido compound are mixed with ammonia gas and allowed to react near a substrate heated to a temperature in the range of 100.degree. C. to 400.degree. C., resulting in deposition of a film on the substrate.

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