Process for chemical vapor deposition of superconductive oxide

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 62, 4272553, 4272552, 4272551, 427255, 4272481, 427314, 505730, C23C 1600, B05D 512

Patent

active

049314254

ABSTRACT:
A thin film of a high temperature superconductive oxide of rare earth metal-alkali earth metal-copper-oxygen system or group VA metal-alkali earth metal-copper-oxygen system, which has an excellent crystallinity, particularly a single crystalline structure, is formed on a substrate by a CVD method, in which halides of the metals and an oxygen source gas are separately flowed over a substrate and caused to react with each other over the substrate, to deposit a desired superconducting oxide film.

REFERENCES:
patent: 3982049 (1976-09-01), Mee et al.
patent: 4699800 (1987-10-01), Dustmann et al.
Bednorz et al., "Possible High Tc Superconductivity in the Ba--La--Cu--O System", Z. Phys. B-Condensed Matter 64, p. 189-193 (1986).
Maeda et al., "A New High-Tc Oxide Superconductor without a Rare Earth Element", Jpn. J. Appl. Phys., vol. 27, No. 2, Feb., 1988, p. 209-210.
Osofsky et al., "Experimental Program on High Tc Oxide Superconductors at the Naval Research Laboratory", MRS Conf. Proc. 4/23/87, p. 173-175.
Hammond et al., "Superconducting Thin Films of the Perovskite Super-Conductors by Electron-Beam Deposition", MRS Conf. Proc. 4/23/87, p. 169-171.
Mogro-Campero et al., "Superconducting Y--Ba--Cu--O Thin Films by Evaporation", MRS Pittsburgh, April, 1988, p. 113-116.
Berry et al. "Formation of High Tc Superconducting Films by Organo-Metallic Chemical Vapor Deposition", Appl. Phys. Lett. 52 (20) May, 1988, p. 1743-1745.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for chemical vapor deposition of superconductive oxide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for chemical vapor deposition of superconductive oxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for chemical vapor deposition of superconductive oxide will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-491608

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.