Process for chemical vapor deposition of a liquid raw material

Details Process for chemical vapor deposition of a liquid raw material Process for chemical vapor deposition of a liquid raw material

1995-03-10

1998-06-16

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

427250, 4272551, 4272552, C23C 1600

Patent

active

057666822

ABSTRACT:
A chemical vapor deposition process is disclosed comprising the steps of forming liquid droplets of a liquid raw material; injecting the liquid droplets through a plate member opening placed opposite to the surface of the substrate to vaporize the liquid droplets; and supplying a reaction gas that reacts with the vaporized raw material; and depositing a thin film on the substrate.

REFERENCES:
patent: 4171235 (1979-10-01), Fraas et al.
patent: 4980204 (1990-12-01), Fujii et al.
patent: 5098741 (1992-03-01), Nolet et al.
patent: 5190592 (1993-03-01), Chazee
patent: 5204314 (1993-04-01), Kirlin et al.

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