Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2008-04-08
2008-04-08
Vinh, Lan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S750000, C216S083000
Reexamination Certificate
active
07354870
ABSTRACT:
A process for chemically etching a stereolithography resin involves chemically etching a shaped object of the resin at a temperature in a range of from about 20° C. to about 30° C. for a time of from about 30 seconds to about 60 seconds with a saturated aqueous solution of permanganate, for example potassium permanganate. The process is faster, simpler and uses less environmentally harmful chemicals than previous etching processes for SLA parts. Etching is also more thorough and can reach hard to access places that sand blasting cannot. The etching process may be part of a process for metallization of a rapid prototyping part fabricated by stereolithography. Excellent etch coverage leads excellent coverage by the coating metal and to stronger metal layers.
REFERENCES:
patent: 5015339 (1991-05-01), Pendleton
patent: 5112513 (1992-05-01), Bressel et al.
patent: 5198096 (1993-03-01), Foust et al.
patent: 5213840 (1993-05-01), Retallick et al.
patent: 5229169 (1993-07-01), Chao
patent: 2003/0039754 (2003-02-01), Konigshofen
patent: 2004/0096584 (2004-05-01), Naruskevicius et al.
patent: 2006/0091780 (2006-05-01), Minami
patent: 2006/0231927 (2006-10-01), Ohno
patent: 2006/0264526 (2006-11-01), Klare et al.
patent: 1007523 (1977-03-01), None
patent: 1228513 (1987-10-01), None
patent: 1254493 (1989-05-01), None
patent: 2020624 (1991-01-01), None
patent: 2023846 (1991-02-01), None
patent: 2031422 (1991-02-01), None
patent: 1299935 (1992-05-01), None
patent: 1306409 (1992-08-01), None
patent: 1334924 (1995-03-01), None
patent: 2350422 (2000-05-01), None
patent: 2437105 (2002-11-01), None
Enplate PC-236 Technical Data Sheet. (Enthone-OMI, Inc., New Haven) Jun. 15, 1983.
Enplate Activator 444 Technical Data Sheet. (Enthone-OMI, Inc., New Haven) Jan. 25, 1996.
Enplate PA-493Technical Data Sheet. (Enthone-OMI, Inc., New Haven) Aug. 28, 1996.
Enplate CU-406 Technical Data Sheet. (Enthone-OMI, Inc., New Haven) Jul. 5, 1995.
Luan, B., et al. Applied Surface Science. 156 (2000) pp. 26-38.
Koenig Hans
National Research Council of Canada
Vinh Lan
LandOfFree
Process for chemical etching of parts fabricated by... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for chemical etching of parts fabricated by..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for chemical etching of parts fabricated by... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2751032